WebObject detection performance, as measured on the canonical PASCAL VOC dataset, has plateaued in the last few years. The best-performing methods are complex ensemble … Web10 lug 2024 · Hidetami Yaegashi is a academic researcher from Tokyo Electron. The author has contributed to research in topic(s): Multiple patterning & Extreme ultraviolet …
Considerations for fine hole patterning for the 7nm node (2016 ...
Web22 feb 2024 · 22 February 2024 Fundamental study of polymer dynamic behavior in resist processing. Author Affiliations +. Although Extreme Ultra Violet (EUV) at 13.5 nm wavelength already moved into commercialization state, serious technical issues remain as important challenges. Local variation, such as intra-filed CD uniformity or LER, is typically ... WebDate Published: 15 April 2011 PDF: 7 pages Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79720B (15 April 2011); doi: 10.1117/12.878943 company\u0027s 27
Overview: continuous evolution on double-patterning process
WebKyohei Koike, Kazuki Yamada, Masatoshi Yamato, Hidetami Yaegashi, Takehiro Seshimo, Takahiro Dazai, Katsumi Ohmori, "Desirable material selection on self-aligned multi … Web19 lug 2024 · Patent number: 11315784. Abstract: There is provided a technique of forming an insulating film containing silicon oxide. A coating solution containing polysilazane is applied onto a wafer W, the solvent of the coating solution is volatilized, and the coating film is irradiated with ultraviolet rays in nitrogen atmosphere before performing a ... WebPatents by Inventor Hidetami Yaegashi Hidetami Yaegashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well … company\u0027s 2d